产品资料

Ossila/UV Ozone Cleaner/US/L2002A2-US

Overview
Specifications
Applications
Theory
Videos

ossila"sUVOzoneCleaneriscapableofremovingcontaminationonthesurfaceofsamples,providingyouwithultracleansurfaceswithinminutes.Byusingahigh-powerUVlightsource,ozoneisgenerated-whichthenbreaksdownsurfacecontaminantsintovolatilecompounds.Thesevolatilecompoundsevaporatefromthesurfaceleavingnotrace.Thismethodcanproducenear-atomicallycleansurfaceswithoutcausingdamagetothesample.

Features

HighIntensityUVLamp

TheUVOzoneCleanerhousesahighintensitylowpressuremercuryvapourdischargelamp.Byutilizingtheemissionat185nmand254nmozonecanbegenerated.ThepresenceofozoneandUVlightallowfortheremovaloforganicsandsterilizesthesurface.

LargeCleaningArea

TheIlluminationareais100mmby100mmthisallowsforthecleaningofawidearrayofsamplesincluding:

MicroscopeSlides

4-InchWafer

AFMTips

DicedSubstrates

PetriDishes

AndMore

SimpletouseInterface

TheBrightdisplayandtactilekeypadprovideasimpleinterface,alongsidetheeasytousesoftwareitonlytakesashorttimetostartcleaningyoursamples.Inadditiontheinbuiltsoftwaremonitorsthetemperatureinsidethesystem,thisallowsyoutomakesuredelicatesamplesdonotoverheat.

AddedSafety

Ossila"sUVOzonecleanerhasbeendesignedwithsafetyinmind.AdheringtoBSEN61010-1:2010standardsalongsideEMC,LowVoltageandRoHSCEdirective.Thesystemprovidesuserswithaddedreassurancethattheequipmenttheyareusinghasbeenbuiltwithbothqualityandsafetyinmind.

TheOssilaGuarantee

Ossilaaimtohelpsimplifyresearchthatiswhywegiveafree2yearwarrantyonourequipment.Inadditionweofferrapiddispatchofitems,freeshippingonmanyorders,anddiscountsforlargepurchases.Ontopofthisweprovideexpertsupport,tutorials,andarangeofinformativeguides.

FreeShippingAvailableWithOnlineCheckoutorUpfrontPayments.

OnlyappliestocountrieswithsimplifiedcustomsprocedureswhereFedEx,DHL,orUPScandeliverasnormal,asoutlinedinthetablebelow.

Destination	StandardShippingRate	FreeShipping
UK	£6.99	FREEforordersviaonlinecheckoutorupfrontpaymentover£100
USAandCanada	£24.91	FREEforordersviaonlinecheckoutorupfrontpaymentover£200
EU/EEA	£30.79	FREEforordersviaonlinecheckoutorupfrontpaymentover£250
Asia-Pacific:onlyAustralia,HongKong,Japan,Malaysia,NewZealand,Singapore,SouthKorea,Taiwan,Thailand,Vietnam	£45.27	FREEforordersviaonlinecheckoutorupfrontpaymentover£400

WhataretheusesofUVOzoneCleaning

UVOzonecleaningseesawiderangeofusesacrossmultipledisciplines,thetwomainusesforthetechniqueareforsurfacecleaningandsurfacetreatment.SurfacecleaningusingUVozonecleaningistypicallydoneasafinalstepinacleaningproceduretoremoveresidualorganicsthatarepresentonthesurfaceofasample.Theprocessresultsinanatomicallycleansurfacefreeformanyorganiccontaminants.

SurfacetreatmentusingUVOzoneisalsoapopularapplicationofthistechnique.DuringthecleaningprocesstheformationofozoneandoxygenrADIcalscanresultinreactionwithwatermoleculespresentintheair.Thisresultsintheformationofhydroxideradicals.Thesevaryshortlivedhighlyreactivespeciescanreactwithbondsonthesurfaceofsubstratesresultingintheformationofhighenergyhydroxidegroups.Thiscanhelpwithpreparationofsamplesbyincreasingthesurfaceenergyofasubstrate.

TherearealsootherapplicationsofUVOzonecleaningsuchassurfacesterilization,UVcuring,UVchemicalreactions,andmuchmore.FormoreinformationonthedifferentapplicationsanddetailedexamplesofhowUVOzonecleaningcanbeusedpleaseseeourapplicationstab

HowdoesUVOzoneCleaningWork?

UVOzonecleaningreliesupontheuseofahigh-intensityUVlightsourcewhichilluminatesthesurfacetobecleanedwithtwospecificwavelengthsoflight.Lowpressuremercuryvapourdischargelampsaretypicallyusedwhichhavetwodominantemissionpeaksat184nmand254nm.Uponirradiationmolecularoxygenpresentwithinairisdissociatedbyradiationbelow200nminlength.Thisresultsintheformationoftworadicalsofoxygen.Theseradicalsgoontoreactwithfurthermolecularoxygenformingmoleculesofozone.

Atthesametimelightat254nmisusedtoexciteorganicspeciespresentonthesurfaceofthesample.Thisprocessincreasesthereactivityofthecontaminantswithozone.Uponreactingthematerialiscleanedfromthesurface.FormoreinformationonthecleaningprocessandalsohowUVozonecleaningcanalterthesurfaceenergyofsubstratepleaseseeourtheorytabonthispage.

Specifications

UVlamptype	SyntheticQuartzUVGridLamp
UVlampdominantwavelengths	185nmand254nm
UVlampdimensions	100mmx100mm
UVlampcurrent	30mA(constant)
254nmoutputintensity	20µW/cm2atdistanceof100cm
UVlamplifetime	T80(2000hours);8-10yearsofstandarddailyuse
Powersupply	Mains220-240VACFusedat1A
OptionalAC/ACAdapter	110V/230V
Maxruntime	59minutes59seconds
Safetyfeatures	Safetyinterlock,Hightemperaturewarning,thermalcutout
Substratetraysize	100mmx100mm
Maximumrecommendedsubstratesize	100mmx100mm
OverallDimensions	Width204mm Height227mm Depth300mm

*PleasenotethatthisUVOzoneCleanerdoesNOThaveanintegratedozonefiltrationsystem,andmustthereforebeoperatedinaworkingfumehood.

Datasheets

UVLampSpectrum(Graphofrelativeintensityofemissionspectrum)

UVLampLifetime(Graphofrelativeintensityoveroperationaltimeinhours)

ComplianceDocuments

DeclarationofConformance(LowVoltageDirective,EMCDirective,RoHSDirective,andBSEN61010-1:2010)

UserManual

UserManual

GeneralApplications

UVOzonecleaningisaversatiletechnique,itcanbeappliedtoawidearrayofmaterialstoprovidesurfacecleaningandtreatment.ItcanalsobeusedforavarietyofotherapplicationswhichrequireeitherthepresenceofozoneorUVlight.BelowisalistofcommonmaterialsthatcanbetreatedusingUVozonecleaning:

Quartz/Glass

Silicon/SiliconOxides

Metals(e.gGold,Silver,Steel)

TransparentConductors(ITO,FTO,IZO,AZO)

MetalOxides(e.gAluminiumOxide,TitaniumOxide)

III-VSemiconductors(e.gGalliumArsenide,SiliconNitride)

AFM/STMProbes

OpticalComponents

IfyouwouldliketoknowifyourmaterialissuitableforusewithUVOzonecleaningpleasefeelfreetocontactusatinfo@ossila.com.

UVOzonecleaningisaversatiletechniquenotonlycanitbeusedacrossawidearrayofmaterialsbutitcanalsobeusedtoperformavarietyofdifferenttasks.BelowisalistofsomeofthecommonapplicationsofUVOzonetreatment:

Surfacecleaning

UVcuring

Surfacesterilization

UVchemicalreactions

SurfaceTreatment

Removalofsurfacemonolayers

Oxidationofsurfaces

Micropatterning

ApplicationNotes

RemovalofSurfaceMonolayersandImprovingSurfaceHydrophilicity

InthisapplicationweusedtheUVozonecleanertoremoveasurfacelayerofn-octadecyltrichlorosilane(OTS)toimprovethewettingofwater-basedsolutionsonasiliconsubstrate.OTSisanorganicmoleculewhichisusedinthefabricationoforganicfieldeffecttransistorstoimprovetheelectricalpropertiesofdepositedfilms.OTSconsistsofatrichlorosilanegroupwhichreactswiththenativeoxideofsilicontoformthreesiloxanebondswiththesurface.ThesebondsrepeatacrossthesurfaceofthesiliconsubstrateuntiltheentiresurfaceiscoveredinamonolayerofOTS.Thelonghydrocarbonchainswhicharepresentresultinthesubstratehavingaverylowsurfaceenergy.

n-Octadecytrichlorosilane Molecule — Moleculeofn-octadecyltrichlorosilane(OTS).

Wettingofhighsurfaceenergysolvents,suchaswater,becomeimpossIBLeandthecontactangleofdepositeddropletsarethereforehigh.TheOTStreatedsubstratewasexposedtoUVozoneforapproximately10minutestocleanthesurfaceoftheoctadecanecarbonchains.BelowisanimageofawaterdropletpresentonthesurfaceofanOTStreatedsiliconsubstrateandanimageofadropletaftertreatment.Thetreatmenthasincreasedthesurfaceenergyenoughtoallowcompletewettingofthewaterdropletonthesubstratessurface.

High energy substrate surface before UV Ozone cleaning — WaterdroponOTS-treatedsiliconsubstrate(300nmSiO₂onsurface)beforeUVozonecleaning(left)andafter10minutesUVozonecleaning(right).

Low energy substrate surface after UV Ozone cleaning — WaterdroponOTS-treatedsiliconsubstrate(300nmSiO₂onsurface)beforeUVozonecleaning(left)andafter10minutesUVozonecleaning(right).

SurfaceTreatmentofPMMASubstratestoReduceContactAngle

PlasticssubstrateshaveverylowsurfaceenergyduetotheabundanceofC-Hbondsandothersimilarlowenergybonds.Coatingthinfilmsfromsolutionsthathavehighsurfacetensionsolventscanbedifficultduetothepoorwettingthatoccurs.Onemethodtoassessthedegreeofwettingistolookatthecontactangleadropletmakesonthesurfaceoftehsusbtrate.Thelwoerthecontactanglethataparticularsovlentmakesthebetterthewettingit.UVozonecleaningcanbeusedtotreatthesurfacetoimprovethewettingofsolvents.

DuringtheprocessofUVozonetreatmentozonereactswithsurfacebondsbreakingdowntheorganicgroupsandeventuallyreleasingvolatilespecies.DuringtheprocessintermediatestepsoccurinwhichlowenergybondssuchastheC-HbondarereplacedwithhigherenergygroupssuchasC-OH.Thebelowfigureshowshowsurfacetreatmentcanbeusedtoimprovethesurfaceenergyofasubstrateandthatthelengthofexposuretoozonecanvarythedegreeofsurfaceenergychange.

Surface Treatment of PMMA Substrates Via UV Ozone Cleaning — ContactanglemeasuremetnsofwatertakenonPMMAsubstratesaftervaryinglengthsofUVOzoneexposuretime.

HowDoesUVOzoneCleanSamples?

UVozonecleaningisaphoto-sensitizedoxidationprocessinwhichorganicmoleculesintheirexcitedstatechemicallyreactwithozonemoleculesresultinginthecleavingofbondsandthedissociationofmoleculesfromthesurface.TheprocessutilizesahighintensityUVlightsourcewhichhastwodominantemissionpeaksat185nmand254nm.Thesetwowavelengthsareresponsiblefordifferentprocesseswhichultimatelyresultinthecleaningofthesurface.

Figure1.Videoshowingtheprocessofozoneformationandphoto-sensitizedoxidationoforganiccontaminants.

Radiationbelow200nmisstronglyabsorbedbymolecularoxygen,theenergyoftheabsorbedphotonisenoughtobreaktheoxygen-oxygendoublebondresultingintheformationoftwofreeradicalsofoxygen(O•).Thesefreeradicalscansubsequentlyreactwithmolecularoxygenproducingozonemolecules(O₃).

UVradiationat254nmisreadilyabsorbedbyorganicspeciesthatarepresentonthesurfaceofmanysubstrates.Theexcitonthatisformedwillbeinahighlyenergeticstate,theenergymayalsobehighenoughforcertainmoleculestomakeorganicradicals.

Theexcitedstatesandorganicradicalspeciespresentonthesurfacereadilyreactwithozonepresentwithintheatmosphereresultingintheformationofvolatilespeciessuchascarbondioxide,water,molecularnitrogen,andshortchainorganiccompounds.Thesevolatilecompoundscaneasilydesorbfromthesurfaceunderatmosphericconditionsresultinginapristinesurface.

HowDoesUVOzoneAlterSurfaceEnergy?

UVOzonetreatmentaltersthesurfaceenergyofsamplesviatwomethods,thefirstoftheseisthroughtheremovaloflowenergycontaminantsfromthesurface.Thesearetypicallyorganicatmosphericcontaminantsthathaveadsorbedontothesurfaceofasubstrate.Thesecondwayisthroughtreatmentofthesurfaceandtheformationofhighenergybondsonthesurfaceofthesamples.

Theremovalofcontaminantsisdoneviathephoto-oxidationprocess,thisprocessresultsinthedesorptionofcontaminantsfromthesurfaceduetothechemicalbreakdownoftheorganicmaterial.Theunderlyingsubstrateistypicallyahigherenergysurfacesuchasaceramicorametalthisresultsinthesurfaceenergyofthesampleincreasingincomparisontowhenitwasuntreated.Thistreatmentdoesnotlastforeverasovertimeorganiccontaminantswillbegintoreabsorbbackontothesurfaceslowlydecreasingthesurfaceenergy.

ThesecondwaythatUVOzonetreatmentworkstoimprovethesurfaceenergyisviatheformationofhydroxylfunctionalgroupsonthesurfaceofthesubstrate.Duringtheirradiationprocesslightat253.7nmcanbreakdownwatermoleculesresultingintheformationofOHandOfreeradicals.HydroxylfreeradicalswilltypicallyreactwithozonepresenttoformwaterandOxygen,howeverwhentheUVdegradationofwateroccursnearthesurfaceofthesamplethehydroxylfreeradicalcanreactwiththesurfaceformingafunctionalgroup.Thisfunctionalgrouphasahighbondingenergyresultinginanincreaseinthesurfaceenergyofmostsurfaces.

Formoreinformationonthetheoryofsurfaceenergyandhowtocalculatesurfaceenergiespleasevisitoursurfaceenergyguidepage.

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